| 摘要 |
The focus monitor mark of the present invention includes two dot groups formed with a plurality of dots comprising a resist that is formed in a protruding manner with respect to a wafer surface, and a measurement region. The mark includes a dot pattern mark in which dot groups are arranged so that the dimensions of each dot increase in accordance with an increase in the distance of the dot from the measurement region, two hole groups comprising a plurality of holes formed in the resist on the wafer surface, and measurement region 3. The mark has a hole pattern mark in which each hole is arranged so that the dimensions of each hole increase in accordance with an increase in a distance of the hole from the measurement region.
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