发明名称 SUBSTRATE CONVEYOR AND VERTICAL HEAT TREATMENT APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To suppress or prevent deflection at the central part due to the empty weight of a substrate having a large or super large diameter during substrate conveyance. <P>SOLUTION: In the substrate conveyor comprising a supporting portion 17 to be moved above or below a substrate w of large diameter, and a mechanism 28 provided in the supporting portion 17 in order to support the substrate w by gripping the periphery thereof, the supporting portion 17 is provided with one or a plurality of noncontact suction holding portions 30 for suction holding the central portion of the upper or lower surface of the substrate through an air layer so that the substrate does not deflect at the center of the upper and lower surfaces. The noncontact suction holding portion 30 has a body 31 of circular plane opposing the upper or lower surface of the substrate, a recess 32 formed in the body and having a plane 32a inclining to become deeper toward the center, a plurality of gas jet nozzles 33 provided in the center of the recess 32 and forming a negative pressure by jetting gas radially to flow along the inclined plane, and gas release grooves 34 formed in the periphery of the recess 32 at a proper interval. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008177239(A) 申请公布日期 2008.07.31
申请号 JP20070007222 申请日期 2007.01.16
申请人 TOKYO ELECTRON LTD 发明人 HAGIWARA JUNICHI
分类号 H01L21/677;B65G49/07;H01L21/68 主分类号 H01L21/677
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