| 摘要 |
In order that an exposure apparatus for producing exposed structures in a photosensitive layer arranged on an object, comprising an object carrier and an exposure device, wherein the object carrier and the exposure device can be moved relative to one another in an advance direction and wherein exposure spots can be produced on the photosensitive layer in a position-controlled manner by means of the exposure device transversely with respect to the advance direction, is improved in such a way that a highest possible exposure power is available, i.e. a largest possible number of exposure spots can be produced per unit time, it is proposed that the exposure device has at least one exposure unit with a series of radiation exit regions which are arranged successively in a series direction and from which exposure beams emerge, by means of each of which, passed through an imaging optical system, an exposure spot can be produced on the photosensitive layer and each of which can be deflected by a deflection unit in a deflection direction running transversely with respect to the series direction, such that each exposure beam can produce exposure spots that at least partly overlap one another in a multiplicity of successive exposure spot positions in the deflection direction. |
