| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a polymer for semiconductor lithography, whereby difference between production lots of the polymer can extremely be diminished. <P>SOLUTION: The method for producing the polymer for the semiconductor lithography involves a polymerization process (P) for polymerizing a polymerizable monomer and a polymerization initiator in a solvent by heating. In the process (P), the polymerization pressure is controlled by controlling a liquid level in a vessel (W0) placed between a polymerization tank and the atmosphere in the flow line, and having a structure capable of liquid-sealing. <P>COPYRIGHT: (C)2008,JPO&INPIT |
