ELASTOMER MODIFIED CHEMICAL MECHANICAL POLISHING PAD

摘要

PROBLEM TO BE SOLVED: To obtain a chemical mechanical polishing pad suitable for polishing at least one of optical and magnetic base material.

SOLUTION: A polishing pad includes a polymer matrix, with elastomeric polymers dispersed therein. The polymer matrix has a glass transition temperature exceeding a room temperature, and the elastomeric polymer has an average length of at least 0.1 μm in at least one direction, constituting 1 to 45 vol.% of the polishing pad, and has the glass transition temperature of less than the room temperature. The polishing pad has a diamond conditioner cutting rate which is increased compared to the polishing pad formed from the polymeric matrix without elastomeric polymer.

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