发明名称 Optical integrator for an illumination system of a microlithography projection exposure installation, has two micro lenses with breaking surfaces, which has arc-shaped curves in cutting plane, which runs parallel to optical axis
摘要 <p>The optical integrator has two micro lenses with breaking surfaces, which has arc-shaped curves in cutting plane. The cutting plane runs parallel to the optical axis and contains X-direction. The two refractive powers are so selected that on illuminating the integrator with axially parallel light of the illuminance in a illumination field (16) do not deviate from a given target distribution more than 1 percent, along the X-direction. A sine condition is exactly valid between the a focal plane of two micro lenses and the illumination field. An independent claim is also included for the method for manufacturing of optical integrators.</p>
申请公布号 DE102008006637(A1) 申请公布日期 2008.07.31
申请号 DE20081006637 申请日期 2008.01.22
申请人 CARL ZEISS SMT AG 发明人 WANGLER, JOHANNES
分类号 G02B27/09;G03F7/20 主分类号 G02B27/09
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