发明名称 SYSTEM AND METHOD FOR MEASURING SHAPE, AND EXPOSURE SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide shape measuring system which can reduce affect of reflectance distribution on the surface of measuring object to measure contour with high accuracy. <P>SOLUTION: This shape measuring method for measuring contour of the measuring object comprises: a step for dividing light from light source into measuring light and reference light, allowing the measuring light to be entered aslant on surface of the measuring object, while allowing the reference light to be entered on reference mirror; a step for leading both the measuring light reflected by the measuring object and the reference light reflected by the reference mirror into photoelectric transfer element; a step for detecting interference light made of the measuring light and the reference light with the photoelectric transfer element, while moving the measuring object; and a step for measuring the contour of the measuring object based on the interference signal obtained from the measuring light reflected at the same position on the surface of the measuring object. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008175803(A) 申请公布日期 2008.07.31
申请号 JP20070278962 申请日期 2007.10.26
申请人 CANON INC 发明人 MATSUMOTO TAKAHIRO;SASAKI AKIRA
分类号 G01B11/24;G03F7/207;H01L21/027 主分类号 G01B11/24
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