发明名称 MANAGING METHOD OF SEMICONDUCTOR MANUFACTURING EQUIPMENT, AND MANAGEMENT SYSTEM OF SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a managing method of semiconductor manufacturing equipment and a management system of the semiconductor manufacturing equipment by which a variation factor of a QC value which is not caused by APC control and maintenance is extracted, and causes for abnormalities in semiconductor manufacturing processes are specified. <P>SOLUTION: The management system 100 of the semiconductor manufacturing equipment establishes a QC value variation period including variation of the QC value, based on the QC value obtained by measuring a processed dimension of a wafer processed by the semiconductor manufacturing equipment 2, and on a control signal output from a user interface 8, then retrieves the maintenance of the semiconductor manufacturing equipment 2, or a change of an APC set value before and after the QC value variation period, as events. An analysis period is set between the retrieved events, and a correlation analysis is made concerning the QC value during the analysis period and an EES parameter obtained by monitoring the semiconductor manufacturing equipment 2, then a computed coefficient of correlation and the EES parameter in which the correlation analysis is made are associated with each other, and the variation factor of the QC value is extracted. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008177534(A) 申请公布日期 2008.07.31
申请号 JP20070282277 申请日期 2007.10.30
申请人 TOSHIBA CORP 发明人 MATSUSHITA HIROSHI;SUGAMOTO JIYUNJI;ASANO MASASHI
分类号 H01L21/02;G03F7/20;H01L21/027;H01L21/66 主分类号 H01L21/02
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