发明名称 |
Method and system for determining deformations on a substrate |
摘要 |
A method and system determines deformations in a substrate in the manufacturing of semiconductor devices. At least one property of vertical deformations of the substrate is measured at a plurality of locations on the substrate. Afterward, an automatic computation of horizontal deformations is determined based on the measured properties of vertical deformations with a model for the deformation behavior of the substrate.
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申请公布号 |
US2008182344(A1) |
申请公布日期 |
2008.07.31 |
申请号 |
US20070699926 |
申请日期 |
2007.01.30 |
申请人 |
MUELLER STEFFEN;KERSCH ALFRED;HABETS BORIS;STADTMUELLER MICHAEL;HECHT THOMAS |
发明人 |
MUELLER STEFFEN;KERSCH ALFRED;HABETS BORIS;STADTMUELLER MICHAEL;HECHT THOMAS |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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