发明名称 |
REACTOR FOR WAFER BACKSIDE POLYMER REMOVAL USING AN ETCH PLASMA FEEDING A LOWER PROCESS ZONE AND A SCAVENGER PLASMA FEEDING AN UPPER PROCESS ZONE |
摘要 |
A reactor is provided for removing polymer from a backside of a workpiece. The reactor includes a vacuum chamber having a ceiling, a floor and a cylindrical side wall. A workpiece support apparatus within the chamber is configured to support a workpiece thereon, so that the workpiece has its front side facing the ceiling. The support apparatus leaves at least an annular periphery of the backside of the workpiece exposed. A confinement member defines a narrow gap with the outer edge of the workpiece, the narrow gap being on the order of about 1% of workpiece diameter, the narrow gap corresponding to a boundary dividing the chamber between an upper process zone and a lower process zone. A vacuum pump is coupled to the lower process zone. A lower external plasma-generating chamber introduces a plasma by-product into the lower process zone and a supply of a polymer etch precursor gas coupled to the lower external plasma-generating chamber. An upper external plasma-generating chamber is coupled to introduce a plasma by-product into the upper process zone and a supply of a scavenger species precursor gas coupled to the upper external plasma-generating chamber.
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申请公布号 |
US2008179008(A1) |
申请公布日期 |
2008.07.31 |
申请号 |
US20070685772 |
申请日期 |
2007.03.14 |
申请人 |
COLLINS KENNETH S;HANAWA HIROJI;NGUYEN ANDREW;BALAKRISHNA AJIT;PALAGASHVILI DAVID;CRUSE JAMES P;SUN JENNIFER Y;TODOROV VALENTIN N;RAUF SHAHID;RAMASWAMY KARTIK;SCHNEIDER GERHARD M;YOUSIF IMAD;SALINAS MARTIN JEFFREY |
发明人 |
COLLINS KENNETH S.;HANAWA HIROJI;NGUYEN ANDREW;BALAKRISHNA AJIT;PALAGASHVILI DAVID;CRUSE JAMES P.;SUN JENNIFER Y.;TODOROV VALENTIN N.;RAUF SHAHID;RAMASWAMY KARTIK;SCHNEIDER GERHARD M.;YOUSIF IMAD;SALINAS MARTIN JEFFREY |
分类号 |
H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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