发明名称 SYSTEM AND METHOD FOR PROVIDING A HIGH FREQUENCY RESPONSE SILICON PHOTODETECTOR
摘要 A Silicon photodetector contains an insulating substrate having a top surface and a bottom surface. A Silicon layer is located on the top surface of the insulating substrate, where the Silicon layer contains a center region, the center region being larger in thickness than the rest of the Silicon layer. A top Silicon dioxide layer is located on a top surface of the center region. A left wing of the center region and a right wing of the center region are doped. The Silicon photodetector also has an active region located within the center region, where the active region contains a tailored crystal defect-impurity combination and Oxygen atoms.
申请公布号 WO2008042145(A3) 申请公布日期 2008.07.31
申请号 WO2007US20599 申请日期 2007.09.24
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY;GEIS, MICHAEL, W.;SPECTOR, STEVEN, J.;LENNON, DONNA, M.;GREIN, MATTHEW, E.;SCHULEIN, ROBERT, T.;YOON, JUNG, U.;KAERTNER, FRANZ, XAVER;GAN, FUWAN;LYSZCZARZ, THEODORE, M. 发明人 GEIS, MICHAEL, W.;SPECTOR, STEVEN, J.;LENNON, DONNA, M.;GREIN, MATTHEW, E.;SCHULEIN, ROBERT, T.;YOON, JUNG, U.;KAERTNER, FRANZ, XAVER;GAN, FUWAN;LYSZCZARZ, THEODORE, M.
分类号 H01L21/00 主分类号 H01L21/00
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