PHOTORESISTS COMPRISING NOVOLAK RESIN BLENDS

摘要

A photoresist composition, and a method for forming a photoresist relief image by using the composition are provided to increase dissolution rate and to decrease light velocity. A photoresist composition comprises a radiation sensitive component comprising a diazo-naphthoquinone material; and at least two kinds of different novolac resins, wherein it has a dissolution rate in an aqueous alkali developer is 800Å or more per second. Preferably the novolac resin comprises a cresol reaction product and a reaction product of benzaldehyde and/or salicylaldehyde. A photoresist relief image is formed by coating the composition on a substrate; and exposing and developing the formed photoresist layer.