发明名称 SECOND SCHOTTKY CONTACT METAL LAYER TO IMPROVE GaN SCHOTTKY DIODE PERFORMANCE
摘要 <p>A Schottky contact (110, 112) is disposed atop a surface of a semiconductor (106). A first Schottky contact metal layer (110) is disposed atop a first portion of the semiconductor surface (106). A second Schottky contact metal (112) is disposed atop a second portion of the surface layer and adjoins the first Schottky contact metal layer (110). The first Schottky contact metal layer (110) has a lower work function than the second Schottky contact metal layer (112).</p>
申请公布号 EP1949445(A2) 申请公布日期 2008.07.30
申请号 EP20060837446 申请日期 2006.11.13
申请人 VELOX SEMICONDUCTOR CORPORATION 发明人 ZHU, TING, GANG;PABISZ, MAREK
分类号 H01L29/47 主分类号 H01L29/47
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