GAS INJECTION MEANS FOR UNIFORM GAS INJECTION AND SUBSTRATE PROCESSING APPARATUS COMPRISING THE SAME

摘要

A gas injection unit and a substrate processing apparatus having the same are provided to preclude the non-uniformity of the partial pressure of process gas by using a plurality of ring injectors in order to obtain uniform plasma. RF antennas(50) are installed on a dome(12) for applying RF power. The RF antennas are connected with an RF power source(60). A registration circuit(62) is installed between the RF antenna and the RF power source. A gas outlet(14) is installed at a lower part of a chamber body(11). A substrate mounting device(20) is lifted up and down by a driving shaft(22). A bellows(24) is installed between the substrate mounting device and the chamber to keep vacuum. Ring injectors(40) are used at the chamber body. The ring injector has a ring shape corresponding to a shape of a substrate(s).