发明名称
摘要 PROBLEM TO BE SOLVED: To prevent processing irregularity such as etching irregularity caused by the accumulation of deposits on the surface of the substrate installation stand and to prevent a substrate from being sucked by the substrate installation stand. SOLUTION: The substrate is laid on a susceptor and treated within a treatment room of a treatment apparatus. Two or more convex parts 7 are formed on a base material in the susceptor 100". The susceptor 100" is rectangular. Two or more convex parts 7 constitute orthogonal lattice. An angleθin which one axis of the orthogonal lattice makes with one side of the rectangle exceeds 0 degree, and is≤45 degrees. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP4126286(B2) 申请公布日期 2008.07.30
申请号 JP20040121463 申请日期 2004.04.16
申请人 发明人
分类号 H01L21/3065;H01L21/683;H01L21/68 主分类号 H01L21/3065
代理机构 代理人
主权项
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