发明名称 METHOD FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIELD-ENHANCED PLASMA REACTOR
摘要 <p>METHOD FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIELD - ENHANCED PLASMA REACTOR Methods for rotating a magnetic field in a process chamber is provided herein. In one embodiment, a method for rotating a magnetic field in a process chamber includes forming a magnetic field having a primary shape; changing the primary shape to at least two sequential transitional shapes; and changing the transitional shape to a rotated primary shape. Optionally, the magnetic field may be maintained at an approximately constant magnitude throughout each step. Optionally, a maximum of one current applied to one or more magnetic field producing coils is equal to zero or has its polarity reversed between any two adjacent steps.</p>
申请公布号 SG144099(A1) 申请公布日期 2008.07.29
申请号 SG20070188493 申请日期 2007.12.18
申请人 APPLIED MATERIALS, INC. 发明人 HOGENSON SCOTT A.;LINDLEY ROGER ALAN;HOFFMAN DANIEL J.
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