发明名称 Plating method and electronic device
摘要 A plating method includes the steps of (a) forming a roughened area in a predetermined area of a substrate, (b) forming a surface-active agent layer above at least the roughened area, (c) forming, above the roughened area, a catalyst layer above the surface-active agent layer, and (d) precipitating a metal layer above the catalyst layer.
申请公布号 US7404885(B2) 申请公布日期 2008.07.29
申请号 US20060370570 申请日期 2006.03.08
申请人 SEIKO EPSON CORPORATION 发明人 FURIHATA HIDEMICHI;KIMURA SATOSHI
分类号 C25D5/00;C25D7/00 主分类号 C25D5/00
代理机构 代理人
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