| 摘要 |
<p>A gray tone mask and a pattern transfer method are provided to easily manage a critical dimension by increasing a range of critical dimension in a pattern of a light semi-transmitting part. A gray tone mask comprises a light shielding part, a light projecting part, a light semi-transmitting part by etching a predetermined pattern on the light semi-transmitting part and the shielding part to have a light semi-transmitting layer and a light shielding layer on a transparent substrate. The light semi-transmitting part adjacent to the light shielding part consists of a light semi-transmitting layer forming part(33a) wherein the light semi-transmitting part is formed, and light projecting slit parts(33b, 33c). The light projecting slit parts, in which the transparent substrate is exposed, are formed at a boundary with the light shielding part.</p> |
