发明名称 Semiconductor devices having high conductivity gate electrodes with conductive line patterns thereon
摘要 Semiconductor devices that include a semiconductor substrate and a gate line are provided. The gate line is on the semiconductor substrate and includes a gate insulation pattern and a gate electrode which are stacked on the substrate in the order named. A spacer is on a sidewall of the gate line. A conductive line pattern is on the gate line. The conductive line pattern is parallel with the gate line and is electrically connected to the gate electrode.
申请公布号 US7405450(B2) 申请公布日期 2008.07.29
申请号 US20040777297 申请日期 2004.02.12
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LYU GYU-HO;JUNG SOON-MOON;KIM SUNG-BONG;LIM HOON;CHO WON-SEOK
分类号 H01L29/76;H01L29/78;H01L21/768;H01L21/8238;H01L23/522;H01L29/94;H01L31/062;H01L31/113;H01L31/119 主分类号 H01L29/76
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