发明名称 Thin film transistor, method of manufacturing the same, display apparatus having the same and method of manufacturing the display apparatus
摘要 A thin film transistor includes a gate electrode on a substrate, a gate insulating layer on the substrate, a channel pattern, a source electrode and a drain electrode. The channel pattern includes a semiconductor pattern formed on the gate electrode and overlaying the gate electrode as well as first and second conductive adhesive patterns formed on the semiconductor pattern and spaced apart from each other. The source electrode includes a first barrier pattern, a source pattern and a first capping pattern sequentially formed on the first conductive adhesive pattern. The drain electrode includes a second barrier pattern, a drain pattern and a second capping pattern sequentially formed on the second conductive adhesive pattern. Etched portions of the first and second conductive adhesive patterns have a substantially vertical profile to prevent the exposure of the source and drain electrodes, thereby improving the characteristics of the thin film transistor.
申请公布号 US7405425(B2) 申请公布日期 2008.07.29
申请号 US20050232306 申请日期 2005.09.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM SANG-GAB;KIM SHI-YUL;PARK HONG-SICK;CHOE HEE-HWAN;CHIN HONG-KEE;OH MIN-SEOK
分类号 H01L29/04;G02F1/1368;G09F9/30;H01L21/28;H01L21/3205;H01L21/336;H01L21/768;H01L23/532;H01L29/417;H01L29/423;H01L29/49;H01L29/786 主分类号 H01L29/04
代理机构 代理人
主权项
地址