发明名称 Method of fabricating a semiconductor device package having a semiconductor element with a roughened surface
摘要 A semiconductor device is disclosed, which comprises a semiconductor element in which a laminated film composed of a plurality of layers including an insulating film is formed on a surface of a semiconductor substrate, and a portion of the laminated film is removed from the surface of the semiconductor substrate so that the semiconductor substrate is exposed at the portion, a mounting substrate on which the semiconductor element is mounted, and a resin layer which seals at least a surface side of the semiconductor element with resin.
申请公布号 US7405159(B2) 申请公布日期 2008.07.29
申请号 US20070712373 申请日期 2007.03.01
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 IMOTO TAKASHI;TAKUBO CHIAKI;HOSOKAWA RYUJI;IMORI YOSHIHISA;SATO TAKAO;KUROSAWA TETSUYA;KIRITANI MIKA
分类号 H01L21/302;H01L21/00;H01L21/48;H01L23/31;H01L23/48;H01L23/522;H01L23/532 主分类号 H01L21/302
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