发明名称 Method for manufacturing probe card
摘要 A method for manufacturing a probe card is provided. A first inactive layer, a first patterned photoresist layer and a first metal layer are sequentially formed on a substrate. The first metal layer has first through holes exposing a portion of the first patterned photoresist layer. A second inactive layer and a second patterned photoresist layer are sequentially formed thereon. The second patterned photoresist layer has second through holes exposing the first through holes. Pins are formed inside the first and the second through holes. A second metal layer is formed on the second patterned photoresist layer. One end of each pin is connected to the second metal layer. The pins and the second metal layer are taken out. A circuit carrier having third through holes is provided. The pins are inserted into the third through holes. The second metal layer is patterned to form pinheads.
申请公布号 US7405144(B2) 申请公布日期 2008.07.29
申请号 US20060550910 申请日期 2006.10.19
申请人 CHIPMOS TECHNOLOGIES INC.;CHIPMOS TECHNOLOGIES (BERMUDA) LTD. 发明人 WANG JIUN-HENG
分类号 H01L21/44 主分类号 H01L21/44
代理机构 代理人
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