| 摘要 |
A nitrogen gas control system for a photoresist changing process is provided to prevent damage to a wafer caused by performing a post process at the state that nitrogen gas is compressed after the photoresist changing process, by blocking the supply of nitrogen gas automatically. A door switch(32) is installed at a predetermined position adjacent to an entrance of a semiconductor manufacturing apparatus for receiving a photoresist, and is switched according to the opening of the entrance. A relay(33) includes a coil for receiving current according to the switching state of the door switch and a relay switch to be switched by electromagnetic force. A solenoid valve(35) is formed to open/close an air supply path by using the electromagnetic force generated according to the current applied to the coil. A nitrogen gas air operation valve(40) is operated by the air flow in an opening state of the solenoid valve, in order to control the supply of nitrogen gas by opening/closing a nitrogen gas supply path. |
