| 摘要 |
<p>A high speed substrate process system is provided to increase the processing rate by quickly exchanging substrates before and after processing. A high speed substrate process system comprises a first process chamber(400) including one substrate supporter, a second process chamber(410) including one substrate supporter, a transfer chamber(300) wherein a substrate conveyor(500) is installed, a first substrate outlet(310), a second substrate outlet(320), and a third substrate outlet(330). The first substrate outlet is installed between the transfer chamber and the external part. The second substrate outlet is deposited between the first process chamber and the transfer chamber. The third substrate outlet is positioned between the second process chamber and the transfer chamber. The substrate conveyor takes over the substrates before and after processing by the first substrate outlet. The substrate before processing is transferred to the first or second process chamber via the second and third substrate outlet. The substrates after processing from the first or second process chamber are transferred to the outside via the first substrate outlet.</p> |
