| 摘要 |
<p>A curing composition for photo nano-imprint lithography, and a method for forming a pattern by using the composition are provided to improve radiation curing property, adhesion, releasing property, mechanical properties and solvent resistance. A curing composition for photo nano-imprint lithography comprises 35-99 wt% of a polymerizable unsaturated monomer; 0.1-15 wt% of a photopolymerization initiator; 0.001-5 wt% of at least one selected from a fluorine-based surfactant, a silicone-based surfactant and a fluorine and silicone-based surfactant; and 0.1-50 wt% of an inorganic oxide microparticle. Preferably the polymerizable unsaturated monomer contains a monofunctional polymerizable unsaturated monomer containing an ethylenically unsaturated bond and at least one selected from an oxygen atom, a nitrogen atom and a sulfur atom.</p> |
