发明名称 SEMICONDUCTOR THIN FILM, METHOD FOR PRODUCING SAME, THIN FILM TRANSISTOR AND ACTIVE-MATRIX-DRIVEN DISPLAY PANEL
摘要 Disclosed is a semiconductor thin film which can be formed at a relatively low temperature even on a flexible resin substrate. Since the semiconductor thin film is stable to visible light and has high device characteristics such as transistor characteristics, it does not decrease the luminance of a display when overlapped with the pixel portion in case where the semiconductor thin film is used as a switching device for driving the display. Specifically disclosed is a transparent semiconductor thin film (40) produced by forming an amorphous film containing zinc oxide and indium oxide and then oxidizing the film so that the resulting film has a carrier density of 10+17 cm-3 or less, a hole mobility of 2 cm2/V.sec or more, and an energy band gap of 2.4 EV or more.
申请公布号 KR20080069607(A) 申请公布日期 2008.07.28
申请号 KR20087011741 申请日期 2006.11.16
申请人 IDEMITSU KOSAN CO., LTD. 发明人 YANO KOKI;INOUE KAZUYOSHI;TANAKA NOBUO
分类号 H01L21/336;C01G15/00 主分类号 H01L21/336
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