| 摘要 |
A heating apparatus, a heating method, and a recording medium are provided to suppress lowering of a suction amount by supplying clean gas between a substrate and a heating plate. A heating apparatus includes a process vessel, a heating plate(61), a plurality of projections(81), and a plurality of suction holes(83). The process vessel has a gas introduction hole and a gas discharge hole. The gas introduction hole supplies a purge gas to a surface of a substrate. The gas discharge hole discharges the purge gas supplied through the gas introduction hole. The heating plate is installed in the process vessel. A heating unit for heating the substrate is provided on the heating plate. The plurality of projections are formed on a surface of the heating plate, and hold the substrate. The plurality of suction holes are formed in the heating plate, and suck the substrate to the heating plate side.
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