| 摘要 |
A leak directing device of a semiconductor vacuum facility is provided to check vacuum state of a process chamber before driving the facility by installing a leak director adjacent to an isolation valve. A leak directing device of a semiconductor vacuum facility comprises a process chamber(10), an isolation valve(30), a leak director(40), a leak directing mode switch, and a display. The leak directing gas is supplied into the process chamber through a gas supplying line(11). The semiconductor device is manufactured in the process chamber. The isolation valve opens and closes a vacuum discharge line(12) to discharge leak directing gas from the process chamber by using a vacuum pump(20). The leak director is adjacent to the isolation valve to check concentration of leak directing gas. The leak directing mode switch allows the leak directing gas to be supplied to the process chamber and operates the vacuum pump, the isolation valve, and the leak director. The display displays concentration of leak directing gas visually.
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