发明名称 VACUUM PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus having a foreign substance removing function capable of improving the specimen process yield and the process efficiency. SOLUTION: The vacuum processing apparatus comprises a gate valve for opening and closing a path connecting a processing chamber and a conveyance chamber in a vacuum container for conveying and treating a specimen. At the time of conveying the specimen as the processing object between the processing chamber and the conveyance chamber, the pressure inside the vacuum container is reduced with a pressure adjusting variable valve having a predetermined opening degree disposed in a lower part of the vacuum container. Thereafter, a predetermined amount of gas is supplied into the vacuum container from the introduction hole for forming a gas flow in a state without changing the opening degree of the pressure adjusting variable valve. The specimen is conveyed with the gate valve opened in that state. After the gate valve is closed after specimen conveyance, introduction of the gas is stopped. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008172044(A) 申请公布日期 2008.07.24
申请号 JP20070004023 申请日期 2007.01.12
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 ITO TORU;FUJIMOTO KOTARO;MATSUMOTO EIJI;YOSHIDA ATSUSHI;TANAKA KOTA
分类号 H01L21/3065;C23C14/00;H01L21/677 主分类号 H01L21/3065
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