发明名称 APPARATUS AND METHOD FOR INTRODUCING PARTICLES USING A RADIO FREQUENCY QUADRUPOLE LINEAR ACCELERATOR FOR SEMICONDUCTOR MATERIALS
摘要 A system for forming one or more detachable semiconductor films capable of being free-standing. The apparatus includes an ion source to generate a plurality of collimated charged particles at a first energy level. The system includes a linear accelerator having a plurality of modular radio frequency quadrupole (RFQ) elements numbered from 1 through N successively coupled to each other, where N is an integer greater than 1. The linear accelerator controls and accelerates the plurality of collimated charged particles at the first energy level into a beam of charge particles having a second energy level. RFQ element numbered 1 is operably coupled to the ion source. The system includes an exit aperture coupled to RFQ element numbered N of the RFQ linear accelerator. In a specific embodiment, the system includes a beam expander coupled to the exit aperture, the beam expander being configured to process the beam of charged particles at the second energy level into an expanded beam of charged particles. The system includes a process chamber coupled to the beam expander and a workpiece provided within the process chamber to be implanted.
申请公布号 WO2008058248(A3) 申请公布日期 2008.07.24
申请号 WO2007US84130 申请日期 2007.11.08
申请人 SILICON GENESIS CORPORATION;HENLEY, FRANCOIS, J.;LAMM, ALBERT;ADIBI, BABAK 发明人 HENLEY, FRANCOIS, J.;LAMM, ALBERT;ADIBI, BABAK
分类号 H05H7/00;H01L21/425 主分类号 H05H7/00
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