METHOD OF MANUFACTURING COLOR FILTER

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a color filter which uses a production line equipped with a forming apparatus and a conveying apparatus and reuses a regenerated substrate by providing a MVA (Multi-domain Vertical Alignment) photo resist peeling-off method carried out by using an existing line in the peeling-off of a resist from a substrate having defective MVA photoresist coat produced in the middle of a line to regenerate the substrate, minimizing the stoppage of the apparatus and automatically operating.

SOLUTION: The method of manufacturing the color filter includes a step in which a process for successively controlling a process treatment of the MVA photoresist peeling-off method for peeling off the resist from the substrate having defective resist coat treatment and the action of the substrate is registered to a process control part using a process treatment line for forming a MVA pattern and overall-exposure in the MVA photoresist peeling-off method is carried out in a proximity exposing apparatus under the condition of the exposure which is an NG information recipe of 500-1,000 μm exposure gap and 150-200 mJ/cm2exposure amount.

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