发明名称 POSITIONING APPARATUS AND PHOTOLITHOGRAPHY MACHINE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a positioning apparatus in which the deformation of the top caused by the force of the electromagnetic coupling is suppressed. <P>SOLUTION: The positioning apparatus of the present invention comprises: a first stage 202 for placing an object to be positioned thereon; a second stage 206 for placing the first stage thereon and transporting it; and an actuator 204 for driving the first stage relative to the second stage, wherein the first stage has a hollow structure and comprises a first rib 213 having a rectangle-shaped cross sections along the direction of the force generated by the actuator 204 and along the direction perpendicular to the above direction and constituting a side plate of the first stage; a second rib 211 joined with the first rib at angles therewith and having a lozenge-shaped cross section; and further in the above hollow structure, a third rib 212 running in a direction substantially parallel to the direction of the force generated by the actuator 204 and passing through a point to which the force is applied. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008172137(A) 申请公布日期 2008.07.24
申请号 JP20070005730 申请日期 2007.01.15
申请人 CANON INC 发明人 NAKAZAWA TAKASHI;KIMURA ATSUSHI
分类号 H01L21/027;G03F7/20;G12B5/00;H01L21/68 主分类号 H01L21/027
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