发明名称 EXPOSURE EQUIPMENT, COLLECTION AND DELIVERY EQUIPMENT, AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To provide substrate collection and delivery equipment which improves the throughput of treatment at low cost, by adjusting the collection and delivery of a substrate to the exposure equipment. SOLUTION: By substrate collection and delivery equipment 60 and 70, a substrate that is carried in from a coater device 20 is carried out and distributed to an exposure portion 30. The substrate that is carried out from the exposure portion 30 is collected to a developer device 40; when the throughputs of the coater device 20 and the developer device 40 and the total of the throughputs of a plurality of exposure portions 30 is substantially equal to each other, the throughputs of the coater device 20, developer device 40, and exposure portion 30 can be exerted to the maximum. Thus, throughput can be improved at low cost, even for the exposure portion 30, whose throughput is low by incorporating the substrate collection and delivery equipment 60 and 70. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008172084(A) 申请公布日期 2008.07.24
申请号 JP20070004717 申请日期 2007.01.12
申请人 NIKON CORP 发明人 SHIRAISHI MASAYUKI
分类号 H01L21/027;G03F7/20;H01L21/677 主分类号 H01L21/027
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