| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for a projection optical system which shows less change in a refraction factor and less aberration even if an exposure process is continued for a long period. SOLUTION: Before the projection optical system 4 is mounted on an exposure device body, a lens 4a making up the projection optical system 4 or the optical material 7 of the lens 4a is exposed to light to reduce a change in the refraction factor of the projection optical system 4. COPYRIGHT: (C)2008,JPO&INPIT
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