| 摘要 |
PROBLEM TO BE SOLVED: To provide a position detecting device and an exposure device, capable of measuring, for example, the surfacial position of a substrate with higher accuracy. SOLUTION: The position detection device related to the first aspect of the present invention is provided with an optical axis, a light projection optical system for making two luminous fluxes symmetric with respect to the optical axis incident on a substrate, a light receiver, a light receiving optical system for guiding two luminous fluxes outgoing from the light projection optical system and reflected by the substrate to the light receiver, a detecting unit for detecting respective positions at which the two luminous fluxes outgoing from the light receiving optical system are incident on the light receiver, and a computation unit for computing the surfacial position of the substrate based on the position detected by the detecting unit. At least one of the light projection optical system and the light receiving optical system is commonalized with respect to the two luminous fluxes. COPYRIGHT: (C)2008,JPO&INPIT
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