摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for manufacturing a dielectric thin film, which can improve the productivity by reducing the number of particles. <P>SOLUTION: The method has a step of defining the target number Np of films between dummies for bring the target surface into an initial state, and a step of continuing film deposition processing of the dielectric thin film, until the number Na of films between dummies reaches the target number Np of films between targets. Then, when the number Na of films between dummies reaches the target number Np of films between dummies, only the sputtering gas is introduced into a film deposition chamber, to make dummy sputtering processing for sputtering the target executed, before carrying a subsequent substrate into the film deposition chamber. <P>COPYRIGHT: (C)2008,JPO&INPIT |