| 摘要 |
PROBLEM TO BE SOLVED: To generate a high quality finished surface with a comparatively small quantity of polishing liquid while making a polishing device in a small size. SOLUTION: The polishing device 10 is equipped with: a workpiece 11 rotating and a rotary polisher 18 to scan over the generating line on the workpiece surface while a pressure is applied thereto in its normal direction; and the workpiece 11 is polished with the polisher 18. The arrangement further includes: a rotary table 17 tilting the rotary shaft 11a of the work 11 with respect to the gravitational direction; and moving mechanisms 15. 16 moving the workpiece 11 within the tilting plane of the rotary shaft 11a. A liquid tight vessel 19 arranged rotatable coaxially with the work 1 and also tiltable accommodates the polishing liquid 20, while a plurality of projections 21 are formed on the inner wall of the vessel 19 radially around the rotary shaft 11a. COPYRIGHT: (C)2008,JPO&INPIT
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