发明名称 |
MICROSTRUCTURE, MICROMACHINE, AND MANUFACTURING METHOD OF MICROSTRUCTURE AND MICROMACHINE |
摘要 |
Without sacrificial layer etching, a microstructure and a micromachine are manufactured. A separation layer 102 is formed over a substrate 101 , and a layer 103 to be a movable electrode is formed over the separation layer 102 . At an interface of the separation layer 102 , the layer 103 to be a movable electrode is separated from the substrate. A layer 106 to be a fixed electrode is formed over another substrate 105 . The layer 103 to be a movable electrode is fixed to the substrate 105 with the spacer layer 103 which is partially provided interposed therebetween, so that the layer 103 to be a movable electrode and a layer 106 to be a fixed electrode face each other.
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申请公布号 |
US2008176046(A1) |
申请公布日期 |
2008.07.24 |
申请号 |
US20070748183 |
申请日期 |
2007.05.14 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAGUCHI MAYUMI;IZUMI KONAMI |
分类号 |
B32B3/10;B32B38/10 |
主分类号 |
B32B3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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