发明名称 MICROSTRUCTURE, MICROMACHINE, AND MANUFACTURING METHOD OF MICROSTRUCTURE AND MICROMACHINE
摘要 Without sacrificial layer etching, a microstructure and a micromachine are manufactured. A separation layer 102 is formed over a substrate 101 , and a layer 103 to be a movable electrode is formed over the separation layer 102 . At an interface of the separation layer 102 , the layer 103 to be a movable electrode is separated from the substrate. A layer 106 to be a fixed electrode is formed over another substrate 105 . The layer 103 to be a movable electrode is fixed to the substrate 105 with the spacer layer 103 which is partially provided interposed therebetween, so that the layer 103 to be a movable electrode and a layer 106 to be a fixed electrode face each other.
申请公布号 US2008176046(A1) 申请公布日期 2008.07.24
申请号 US20070748183 申请日期 2007.05.14
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAGUCHI MAYUMI;IZUMI KONAMI
分类号 B32B3/10;B32B38/10 主分类号 B32B3/10
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