发明名称 |
Heating apparatus, heating method, and computer readable storage medium |
摘要 |
A disclosed heating apparatus for heating a substrate on which a film is coated includes a process chamber having a gas supply opening for supplying a first gas to the process chamber and a gas evacuation opening for evacuating the first gas from the process chamber; a heating plate that is arranged in the process chamber and includes a heating element for heating the substrate; plural protrusions arranged on the heating plate so as to support the substrate; plural suction holes formed in the heating plate so as to attract by suction the substrate toward the heating plate; and a gas inlet adapted to supply a second gas to a gap between the heating plate and the substrate supported by the plural protrusions.
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申请公布号 |
US2008175999(A1) |
申请公布日期 |
2008.07.24 |
申请号 |
US20080007975 |
申请日期 |
2008.01.17 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KAWAJI TATSUYA;SAKAI YUICHI;KANEDA MASATOSHI |
分类号 |
B05C11/06;B05D3/00 |
主分类号 |
B05C11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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