DEVICE MANUFACTURING METHOD AND LITHOGRAPHIC APPARATUS
摘要
A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for a period of time so as to stabilize the temperature in the vacuum chamber; decreasing the pressure within the vacuum chamber to a production pressure range; generating a beam of radiation with a radiation system; patterning the beam of radiation; and projecting the patterned beam of radiation through the vacuum chamber onto a target portion of a layer of radiation-sensitive material on a substrate.
申请公布号
WO2008087597(A2)
申请公布日期
2008.07.24
申请号
WO2008IB50160
申请日期
2008.01.16
申请人
ASML NETHERLANDS B.V.;MEIJER, HENDRICUS JOHANNES MARIA;RENKENS, MICHAEL JOZEF MATHIJS
发明人
MEIJER, HENDRICUS JOHANNES MARIA;RENKENS, MICHAEL JOZEF MATHIJS