| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system which is used to substantially reduce the divergence of a beam traveling between master and power oscillators, for example in a laser beam source. <P>SOLUTION: The system comprises the first and second oscillators and a beam adjusting device. The first oscillator is configured to generate a radiation beam. The beam adjusting device is configured to stabilize a position, a direction, a size, or a divergence of the radiation beam to produce an adjusted beam. The second oscillator is configured to amplify the adjusted beam to produce an amplified beam. <P>COPYRIGHT: (C)2008,JPO&INPIT |
