发明名称 |
Apparatus configured to position a workpiece |
摘要 |
An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.
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申请公布号 |
US2008174750(A1) |
申请公布日期 |
2008.07.24 |
申请号 |
US20080068071 |
申请日期 |
2008.02.01 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DANSBERG MICHEL PIETER;CORNELISSEN SEBASTIAAN MARIA JOHANNES;COX HENRIKUS HERMAN MARIE;VAN DIESEN ROBERT JOHANNES PETRUS;KEMPER NICOLAAS RUDOLF;MUNNIG-SCHMIDT ROBERT-HAN;VAN DER SCHOOT HARMEN KLAAS;JANSEN ROB |
分类号 |
G03B27/52;G03F7/20;H01L21/027 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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