MANUFACTURING METHOD OF POLISHING PAD

摘要

PROBLEM TO BE SOLVED: To provide a polishing pad having excellent durability that performs planarization of a material requiring high surface flatness with stability and high polishing efficiency.

SOLUTION: This manufacturing method of the polishing pad includes the steps of: preparing a foam-dispersion urethane composition by a mechanical foaming method; coating the foam-dispersion urethane composition over a sheet A having a nitrogen gas permeation velocity of 1×10-7(cm3/cm2s cmHg) or less; laminating a sheet B having a nitrogen gas permeation velocity of 1×10-7(cm3/cm2s cmHg) or less over the coated foam-dispersion urethane composition; and forming a thermosetting polyurethane foam layer having open cell by curing the foam-dispersion urethane composition while making its thickness uniform by a pressing means.

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