| 摘要 |
The present invention relates to the removal of a gas or of a gas mixture from a closed container. More particularly, the invention provides a method and apparatus particularly useful in the production of semiconductors, for automatically and economically purging a first gas or gas mixture from a closed container. The present invention achieves the above object by providing a method and an apparatus, particularly useful in the production of semiconductors, for automatically and economically purging a first gas or mixture from a closed container, said method having the following steps: step a: providing equipment including a first sensor in fluid communication with the outlet of said container; a source of a second compressed gas suitable for purging said first gas; at least one remotely controllable inlet valve disposed between said source of said compressed gas and the inlet of said container; a flow restrictor disposed in said outlet of said container; an electronic controller connected to and able to receive data from said first sensor and able to control at least one said inlet valve according to a predetermined program relating valve opening to time and to data from said first sensor; step b: sending a start signal, which optionally may be generated automatically, to said electronic controller; step c: start releasing said second gas into said container, the flow rate being controlled by said electronic controller; step d: measuring a parameter of interest by means of a first sensor at the outlet of said container and sending data relating to said parameter to said controller; and step e: adjusting inlet flow in relation to purging progress.
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