发明名称 |
Method of measurement, an inspection apparatus and a lithographic apparatus |
摘要 |
Radiation is projected onto a plurality of targets on a substrate. By assuming that the overlay error derivable from asymmetry varies smoothly across the substrate, the number of targets measured can be reduced. This may result in a smaller area of the scribe lane being used by targets for each layer of the substrate.
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申请公布号 |
US2008174753(A1) |
申请公布日期 |
2008.07.24 |
申请号 |
US20070656004 |
申请日期 |
2007.01.22 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MOS EVERHARDUS CORNELIS;VAN DER SCHAAR MAURITS |
分类号 |
G03B27/42;G01N21/55 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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