发明名称 CHEMICALLY AMPLIFIED RESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a chemically amplified resist composition which shows superior resolution. <P>SOLUTION: The chemically amplified resist composition comprises a resin which comprises a structural unit, having an acid-labile group in a side chain and a structural unit represented by Formula (I) and having a lactone structure in a side chain, and which itself is insoluble or hardly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution due to the action of an acid; and an acid generator represented by Formula (II). <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008170983(A) 申请公布日期 2008.07.24
申请号 JP20070323137 申请日期 2007.12.14
申请人 SUMITOMO CHEMICAL CO LTD 发明人 TAKADA YOSHIYUKI;MIYAGAWA TAKAYUKI;EDAMATSU KUNISHIGE
分类号 G03F7/039;C08F220/26;G03F7/004;H01L21/027 主分类号 G03F7/039
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