发明名称 METHODS AND SYSTEMS FOR PROCESSING SEMICONDUCTOR WORKPIECES
摘要 Methods and systems for processing semiconductor workpieces are disclosed herein. In one embodiment, a method for processing a semiconductor workpiece includes releasably attaching a plurality of microelectronic dies to a first side of a releasable film, and at least partially detaching one of the dies from the releasable film by pivoting a contact member with a surface of the contact member pressing against a second side of the releasable film.
申请公布号 US2008172869(A1) 申请公布日期 2008.07.24
申请号 US20070742419 申请日期 2007.04.30
申请人 MICRON TECHNOLOGY, INC. 发明人 PUAH KIA HENG;TAY LIANG CHEE
分类号 H05K3/30;B23P19/00;H05K13/04 主分类号 H05K3/30
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