发明名称 GAS DISCHARGE TYPE LASER DEVICE, EXPOSURE METHOD AND DEVICE, AND METHOD FOR MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a gas discharge type laser device in which an optical system can be adjusted easily even if an oscillation frequency is increased and an impact of an impulse wave generated from a discharge region is small. <P>SOLUTION: The gas discharge type laser device comprises two chambers 100 and 200 filled with laser gas, first discharge electrodes 10a and 10b arranged oppositely in the chamber 100, second discharge electrodes 20a and 20b arranged in the chamber 200 oppositely and substantially coaxially with the first electrodes, a laser resonator composed of an output mirror OC and a narrow band module LNM arranged oppositely to hold the two pairs of electrodes between, and discharge circuits 1 and 2 for making the two pairs of electrode alternately discharge electricity. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008171852(A) 申请公布日期 2008.07.24
申请号 JP20070001015 申请日期 2007.01.09
申请人 NIKON CORP 发明人 MOGI KIYOSHI
分类号 H01S3/038;H01L21/027 主分类号 H01S3/038
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