发明名称 |
IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE |
摘要 |
An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
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申请公布号 |
US2008174757(A1) |
申请公布日期 |
2008.07.24 |
申请号 |
US20070936768 |
申请日期 |
2007.11.07 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
HUMMEL WOLFGANG;FISCHER JURGEN;AUBELE KARL-EUGEN;MERZ ERICH;REINER RAOUL;RIEF KLAUS;SCHONGART STEFAN;NEUMAIER MARKUS;TROSSBACH BARBEL;WEBER ULRICH;MUHLBEYER MICHAEL;HOLDERER HUBERT;KOHL ALEXANDER;WEBER JOCHEN;LIPPERT JOHANNES;RASSEL THORSTEN |
分类号 |
G02B7/02;G03B27/54;G03F7/20;G03F7/207;H01L21/027 |
主分类号 |
G02B7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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