发明名称 MANUFACTURING EQUIPMENT OF LIQUID CRYSTAL DEVICE AND MANUFACTURING METHOD OF LIQUID CRYSTAL DEVICE
摘要 PROBLEM TO BE SOLVED: To provide manufacturing equipment of liquid crystal device which is equipped with a sputtering device of opposite target type and, thereby, can form an inorganic alignment film with high productivity. SOLUTION: The manufacturing equipment of a liquid crystal device, which is provided with a liquid crystal layer held between a pair of substrates facing each other and has an inorganic alignment film formed on the inner surface side of at least one side substrate, is equipped with film forming chambers 2, 2 and the sputtering device 3 which film-forms alignment film material on the substrate W according to a sputtering method in the film-forming chambers. The sputtering device comprises a pair of targets 5a, 5b which are opposite to each other across a plasma generation region and opening parts 3a, 3a which are disposed on both sides across the plasma generation region and respectively release sputter particles 5p from the plasma generation region. The film forming chambers are disposed corresponding to the respective opening parts. The opening parts are disposed respectively on positions where the sputter particles are made incident from oblique directions with respect to the inorganic alignment film formation surfaces of the substrates in the film forming chambers. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008170869(A) 申请公布日期 2008.07.24
申请号 JP20070005907 申请日期 2007.01.15
申请人 SEIKO EPSON CORP 发明人 ASUKE SHINTARO
分类号 G02F1/1337;C23C14/34 主分类号 G02F1/1337
代理机构 代理人
主权项
地址